Exceeding 11.19 kW but under 22.38 kW
Air or vacuum pumps, air or other gas compressors and fans; ventilating or recycling hoods incorporating a fan, whether or not fitted with filters; gas-tight biological safety cabinets, whether or not fitted with filters; parts thereof: > Other, except parts: > Air compressors: > Other > Stationary: > Rotary: > Exceeding 11.19 kW but under 22.38 kW
Duty Rate (from China)
Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
Except as provided in headings 9903.88.13, 9903.88.18, 9903.88.33, 9903.88.34, 9903.88.35, 9903.88.36, 9903.88.37, 9903.88.38, 9903.88.40, 9903.88.41, 9903.88.43, 9903.88.45, 9903.88.46, 9903.88.48, 9903.88.56, 9903.88.64, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(e) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(f)
Products classified under HTS 8414.80.16.65
Edwards EDP1200 Dry Rotary Pump
A 16 kW stationary dry rotary pump for semiconductor wafer lapping and polishing stations, providing contaminant-free vacuum. It matches HTS 8414.80.1665 as a rotary stationary air/vacuum pump in the specified power range for cleanroom semiconductor prep equipment.
Leybold Graphix RXP 1600 Pump
14 kW stationary rotary roughing pump for evacuating semiconductor deposition chambers prior to high-vac processing. Fits HTS 8414.80.1665 for rotary stationary air/vacuum pumps 11.19-22.38 kW used in wafer fabrication.
Applied Materials Centura Rotary Compressor
A stationary rotary air compressor rated at 15 kW, designed for high-purity gas delivery in semiconductor wafer fabrication cleanrooms. It falls under HTS 8414.80.1665 due to its power range exceeding 11.19 kW but under 22.38 kW, stationary rotary configuration, and use in semiconductor manufacturing processes like crystal growth support.
Lam Research VMAX Rotary Vacuum Pump
Stationary rotary vacuum pump at 18 kW power output, specialized for evacuating chambers in semiconductor etching and deposition tools. Classified in HTS 8414.80.1665 for its rotary design, stationary installation, and power specs tailored to semiconductor processing environments.
Pfeiffer Vacuum HiPace 2300 Compressor
Stationary rotary compressor at 13.5 kW for gas handling in semiconductor crystal grower systems using Czochralski method. HTS 8414.80.1665 applies to its power rating, rotary stationary design, and role in semiconductor boule production.