Edwards EDP1200 Dry Rotary Pump from Canada
A 16 kW stationary dry rotary pump for semiconductor wafer lapping and polishing stations, providing contaminant-free vacuum. It matches HTS 8414.80.1665 as a rotary stationary air/vacuum pump in the specified power range for cleanroom semiconductor prep equipment.
Duty Rate — Canada → United States
25%
Rate breakdown
9903.82.0925%Except as provided for in headings 9903.82.16, 9903.82.20–9903.82.26 and 9903.85.68, articles of copper and derivative aluminum and steel articles, as provided for in subdivisions (c)(vi)–(viii) and (xi) of U.S. note 16 to this subchapter
9903.05.900%Articles already subject to Section 232 (steel/aluminum/copper + derivatives, autos + parts, wood, medium/heavy vehicles + parts, semiconductors, patented pharma) — U.S. note 52(f)
Import Tips
• Include material compatibility certs (e.g
• PTFE components) for semiconductor chemical resistance
• Declare as 'hermetic' if gas-tight for biological safety integrations in wafer fabs
• Avoid reclassification by documenting exclusion of fan hood functions