Edwards EDP1200 Dry Rotary Pump from Canada
A 16 kW stationary dry rotary pump for semiconductor wafer lapping and polishing stations, providing contaminant-free vacuum. It matches HTS 8414.80.1665 as a rotary stationary air/vacuum pump in the specified power range for cleanroom semiconductor prep equipment.
Duty Rate — Canada → United States
10%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
Import Tips
• Include material compatibility certs (e.g
• PTFE components) for semiconductor chemical resistance
• Declare as 'hermetic' if gas-tight for biological safety integrations in wafer fabs
• Avoid reclassification by documenting exclusion of fan hood functions