Inline Wafer Overlay Metrology System
Real-time optical metrology tool measuring overlay accuracy between lithographic layers on production semiconductor wafers. Uses broadband illumination and image analysis. Classified HTS 9031.41.0060 for other semiconductor wafer optical inspection.
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Alternative Classifications
This product could be classified differently depending on its characteristics or intended use.
If non-optical overlay measurement using electrical test
Other wafer inspection methods excluding optical technologies.
If general pattern alignment projectors
Profile projectors and similar for non-semiconductor overlay.
If integrated into automated wafer processing lines
Industrial robots/handling machines with inspection capability.
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Import Tips & Compliance
• Include inline production specs to distinguish from lab benchtop tools
• Classify software-embedded systems as complete instruments, not parts
• Verify SEMI standards compliance for semiconductor industry acceptance
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