Inline Wafer Overlay Metrology System from China
Real-time optical metrology tool measuring overlay accuracy between lithographic layers on production semiconductor wafers. Uses broadband illumination and image analysis. Classified HTS 9031.41.0060 for other semiconductor wafer optical inspection.
Duty Rate — China → United States
25%
Rate breakdown
9903.88.0125%Except as provided in headings 9903.88.05, 9903.88.06, 9903.88.07, 9903.88.08, 9903.88.10, 9903.88.11, 9903.88.14, 9903.88.19, 9903.88.50, 9903.88.52, 9903.88.58, 9903.88.60, 9903.88.62, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(a) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(b) [to this subchapter]
9903.05.860%Articles provided for in subdivision (b) of U.S. note 52 to this subchapter
Import Tips
• Include inline production specs to distinguish from lab benchtop tools
• Classify software-embedded systems as complete instruments, not parts
• Verify SEMI standards compliance for semiconductor industry acceptance