Inline Wafer Overlay Metrology System from Germany
Real-time optical metrology tool measuring overlay accuracy between lithographic layers on production semiconductor wafers. Uses broadband illumination and image analysis. Classified HTS 9031.41.0060 for other semiconductor wafer optical inspection.
Duty Rate — Germany → United States
10%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
Import Tips
• Include inline production specs to distinguish from lab benchtop tools
• Classify software-embedded systems as complete instruments, not parts
• Verify SEMI standards compliance for semiconductor industry acceptance