Gallium Arsenide Wafer Polisher Race

Titanium outer race for chemically inert ball bearings polishing GaAs wafers to atomic flatness. Resists CMP slurry corrosion during 0.5μm/min removal rates. HTS 8482.99.05.00 as outer ring for ball bearings in semiconductor processing.

Import Duty Rates by Country of Origin

Origin CountryMFN RateCh.99 SurchargesTotal Effective Rate
🇨🇳China9.9%+35.0%44.9%
🇲🇽Mexico9.9%+10.0%19.9%
🇨🇦Canada9.9%+10.0%19.9%
🇩🇪Germany9.9%+10.0%19.9%
🇯🇵Japan9.9%+10.0%19.9%

Alternative Classifications

This product could be classified differently depending on its characteristics or intended use.

8108.90.60Lower: 40% vs 44.9%

If wrought titanium articles

General titanium fabrications outside bearing use.

8424.89.90Lower: 36.8% vs 44.9%

If chemical mechanical planarization machines

CMP equipment for semiconductors per statistical notes.

3824.99Lower: 15% vs 44.9%

If prepared CMP slurries/binders

Chemical additives for polishing, not hardware.

Not sure which classification is right?

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Import Tips & Compliance

Specify GaAs compatibility and slurry types (e.g

colloidal ceria)

Include titanium grade (Grade 5 ELI) and passivation details

Import before machine integration to leverage parts rates

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