Wafer Lapping Machine Polishing Pad
Specialized polyurethane polishing pad for wafer lappers and polishers that achieve flatness tolerances for semiconductor fabrication readiness. A consumable part under HTS 8475.90.90.00 for wafer preparation apparatus.
Import Duty Rates by Country of Origin
| Origin Country | MFN Rate | Ch.99 Surcharges | Total Effective Rate |
|---|---|---|---|
| π¨π³China | Free | +35.0% | 35% |
| π²π½Mexico | Free | +10.0% | 10% |
| π¨π¦Canada | Free | +10.0% | 10% |
| π©πͺGermany | Free | +10.0% | 10% |
| π―π΅Japan | Free | +10.0% | 10% |
Alternative Classifications
This product could be classified differently depending on its characteristics or intended use.
If as general natural abrasives
Polishing pads not proven for semiconductor wafer tolerances go to Chapter 68 abrasives.
If generic plastic articles
Unspecified polymer pads default to Chapter 39 plastics if not machine-specific.
Not sure which classification is right?
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Import Tips & Compliance
β’ Certify pad material and surface finish specs for <1 micron flatness in semiconductor use
β’ Import in bulk with machine compatibility declaration to prevent parts reclassification
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