Wafer Lapping Plate

Cast iron or ceramic lapping plate for simultaneous double-side lapping of semiconductor wafers to achieve total thickness variation (TTV) tolerances, specific to 8472.90.50 lappers. Provides uniform material removal for flatness. HTS 8473.40.41.00 classification.

Import Duty Rates by Country of Origin

Origin CountryMFN RateCh.99 SurchargesTotal Effective Rate
🇨🇳China2%+35.0%37%
🇲🇽Mexico2%+10.0%12%
🇨🇦Canada2%+10.0%12%
🇩🇪Germany2%+10.0%12%
🇯🇵Japan2%+10.0%12%

Alternative Classifications

This product could be classified differently depending on its characteristics or intended use.

8479.89Lower: 12.5% vs 37%

If general lapping machine plates

Unspecified mechanical appliances parts cover non-8472 lapping equipment.

6909.19.50Higher: 39% vs 37%

If predominantly ceramic construction

Ceramic articles shift if not proven as semiconductor machine principal part.

Not sure which classification is right?

Our AI classifier can analyze your specific product and recommend the correct HTS code with confidence.

Import Tips & Compliance

Specify plate flatness specs (<1μm) and conditioning slurry compatibility

Provide evidence of use in double-side lapping vs single-side grinding

Watch for reclassification if plate size fits general precision lapping machines

Related Products under HTS 8473.40.41.00

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Radio frequency induction coil used in float zone furnaces for producing high-purity silicon crystals from polycrystalline rods, specific to 8472.90.50 machines. It generates the molten zone for zone refining without crucibles. Classified in HTS 8473.40.41.00 for semiconductor processing equipment parts.

Crystal Ingot Weighing Sensor Assembly

Load cell assembly integrated into Czochralski pullers (8472.90.50) for real-time monitoring of crystal growth weight and pull rate control. Ensures boule diameter uniformity. Part of HTS 8473.40.41.00 semiconductor equipment.

Czochralski Crystal Puller Heater Element

A graphite or molybdenum heater element designed specifically for Czochralski crystal growers used in semiconductor wafer production, falling under machines of 8472.90.50. It provides precise high-temperature control for pulling monocrystalline silicon boules. Classified as a part of semiconductor manufacturing equipment in HTS 8473.40.41.00.

Semiconductor Wafer Slicing Saw Blade

Diamond-impregnated saw blade engineered for inner-diameter (ID) saws that slice monocrystalline semiconductor boules into thin wafers, exclusive to machines of 8472.90.50. It ensures minimal kerf loss and high precision for silicon wafer preparation. Fits HTS 8473.40.41.00 as a dedicated accessory.

Wafer Grinder Diamond Wheel

Resin or metal-bonded diamond grinding wheel for back-grinding semiconductor wafers to precise thickness post-processing, dedicated to 8472.90.50 grinders. Achieves flatness critical for device fabrication. HTS 8473.40.41.00 applies as specialized semiconductor part.

Crystal Boule Grinder Flatting Wheel

Specialized grinding wheel for creating orientation flats on silicon boules to indicate crystal plane and doping type, used in 8472.90.50 crystal grinders. Ensures wafers sliced from boule have correct conductivity markers. Part of HTS 8473.40.41.00.