CNC Silicon Wafer Polishing Tool
Numerically controlled polishing machine employing abrasive slurries to finish silicon wafer surfaces to nanometer-level flatness for semiconductor device fabrication. Classified in HTS 8460.90.4060 due to its grinding/polishing function on metal surfaces using abrasives in a CNC configuration. Critical for removing defects post-lapping in wafer preparation.
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Alternative Classifications
This product could be classified differently depending on its characteristics or intended use.
If for thermal processing in semiconductor production
Heating equipment for semiconductor materials uses different headings outside machine tools.
If not specifically for metal or cermets
Non-metal finishing machines fall outside this metal-specific subheading.
If integrated with semiconductor testing optics
Laser-based or optical finishing with testing functions shifts to Chapter 90.
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Import Tips & Compliance
• Provide slurry compatibility and polishing pad specifications to demonstrate abrasive finishing capability
• Obtain ISO cleanroom certifications to support classification and avoid general polishing machine pitfalls
• Declare exact numerical control software version for customs verification
Related Products under HTS 8460.90.40.60
Numerically Controlled Wafer Lapping Machine
A precision numerically controlled machine used in semiconductor manufacturing to lap silicon wafers, achieving ultra-flat surfaces within tight tolerances for subsequent fabrication processes. It falls under HTS 8460.90.4060 as a numerically controlled grinding/lapping machine for finishing metal (silicon wafers are metallically processed). Designed specifically for preparing semiconductor wafers from crystal boules.
Numerically Controlled Wafer Grinder for Crystal Boules
CNC grinder designed to precision-grind semiconductor crystal boules to exact diameters and flats indicating conductivity type, as per statistical notes for wafer preparation. Falls under HTS 8460.90.4060 as a numerically controlled machine for grinding metal (silicon) using abrasives. Essential step before slicing wafers from monocrystalline boules.
CNC Semiconductor Wafer Edge Profiling Machine
Numerically controlled abrasive machine for profiling and chamfering wafer edges to prevent chipping during handling and processing in semiconductor fabs. Classified under HTS 8460.90.4060 for its grinding/finishing of metal wafers using polishing products. Improves yield in wafer manufacturing workflow.
Precision CNC Lapper for Gallium Arsenide Wafers
Advanced numerically controlled lapping system optimized for compound semiconductor wafers like gallium arsenide, using specialized abrasives for flatness finishing. HTS 8460.90.4060 applies as it finishes cermet-like semiconductor materials via lapping/polishing. Used post-slicing for high-performance device substrates.
Numerically Controlled Double-Sided Wafer Polisher
CNC machine that simultaneously polishes both sides of semiconductor wafers using abrasive pads and slurries for mirror-like surface finish. Falls under HTS 8460.90.4060 as a numerically controlled polishing tool for metal wafer finishing. Key for achieving total thickness variation specs in wafer production.