Wafer Polishing Slurry Feed Nozzle
Sapphire or ceramic nozzle assembly that precisely delivers polishing slurry to wafer surfaces during CMP preparation. Controls flow rate for uniform material removal. Part of wafer polishing equipment under 8442.40.00.00.
Import Duty Rates by Country of Origin
Alternative Classifications
This product could be classified differently depending on its characteristics or intended use.
If general spray nozzles
Mechanical appliances for spraying liquids use 8424; semiconductor specificity required.
If refractory ceramic nozzles only
Plain ceramic products without machinery function go to Chapter 69.
Not sure which classification is right?
Our AI classifier can analyze your specific product and recommend the correct HTS code with confidence.
Import Tips & Compliance
• Specify orifice diameter (0.2-0.5mm) and material compatibility (silica/ceria slurries)
• Include wear rate data; nozzles >500 hours life classify as durable parts
• Bundle only with matching polishers; separate import prevents set classification
Related Products under HTS 8442.40.00.00
Czochralski Crystal Puller Replacement Heating Element
This graphite or molybdenum heating element is a critical replacement part for Czochralski crystal pullers used in semiconductor wafer boule production. It provides precise temperature control during the crystal growth process from molten silicon. Classified under 8442.40.00.00 as a part of machinery for preparing printing components, per statistical notes covering semiconductor crystal growers.
Semiconductor Wafer Slicing Diamond Saw Blade
Precision diamond-impregnated saw blade designed for slicing monocrystalline silicon boules into thin wafers for semiconductor fabrication. Ensures minimal kerf loss and high surface quality. Falls under 8442.40.00.00 as a part of wafer slicing saws in semiconductor preparation equipment.
Crystal Boule Grinder Spindle Assembly
High-precision spindle assembly for crystal grinders that shape semiconductor boules to exact wafer diameters and grind orientation flats. Features air bearings for vibration-free operation. Classified as parts of wafer preparation equipment under 8442.40.00.00.
Wafer Lapping Machine Polishing Pad
Polyurethane polishing pad for wafer lappers and grinders that achieve sub-micron flatness on semiconductor wafers prior to fabrication. Designed for chemical-mechanical planarization compatibility. Part of wafer preparation apparatus under 8442.40.00.00.
Float Zone Crystal Grower RF Heating Coil
Radio frequency induction coil for float zone crystal growers producing ultra-pure silicon ingots without crucibles. Enables zone refining for high-resistivity wafers. Counts as parts of semiconductor crystal pullers/growers in 8442.40.00.00.
Wafer Grinder Air Bearing Chuck
Porous ceramic air bearing chuck that holds semiconductor wafers during grinding with near-zero friction and contamination. Maintains wafer flatness within 0.1 microns. Essential part of wafer grinder/polisher equipment under 8442.40.00.00.