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Chemical Mechanical Wafer Polisher

CMP polishers use chemical slurries and polishing pads to achieve mirror-finish semiconductor wafer surfaces for lithography. Falls under HTS 8442.30.01 as equipment for final printing component preparation.

Import Duty Rates by Country of Origin

Origin CountryMFN RateCh.99 SurchargesTotal Effective Rate
🇨🇳ChinaFree+35.0%35%
🇲🇽MexicoFree+10.0%10%
🇨🇦CanadaFree+10.0%10%
🇩🇪GermanyFree+10.0%10%
🇯🇵JapanFree+10.0%10%

Alternative Classifications

This product could be classified differently depending on its characteristics or intended use.

8424.89.10.00Same rate: 35%

If general mechanical appliances for surface treatment

Heading 8424 for unspecified surface treatment; process specificity governs.

8479.89Lower: 12.5% vs 35%

If other semiconductor processing machines not printing-related

Catch-all for semiconductor equipment outside statistical notes.

Not sure which classification is right?

Our AI classifier can analyze your specific product and recommend the correct HTS code with confidence.

Import Tips & Compliance

• Include slurry flow rate and pad pressure specs for classification

• Declare chemical handling systems separately if modular