Chemical Mechanical Wafer Polisher

CMP polishers use chemical slurries and polishing pads to achieve mirror-finish semiconductor wafer surfaces for lithography. Falls under HTS 8442.30.01 as equipment for final printing component preparation.

Import Duty Rates by Country of Origin

Origin CountryMFN RateCh.99 SurchargesTotal Effective Rate
🇨🇳ChinaFree+35.0%35%
🇲🇽MexicoFree+10.0%10%
🇨🇦CanadaFree+10.0%10%
🇩🇪GermanyFree+10.0%10%
🇯🇵JapanFree+10.0%10%

More Specific Codes

This product may fall under a more specific subheading:

Alternative Classifications

This product could be classified differently depending on its characteristics or intended use.

8424.89.10.00Same rate: 35%

If general mechanical appliances for surface treatment

Heading 8424 for unspecified surface treatment; process specificity governs.

8479.89Lower: 12.5% vs 35%

If other semiconductor processing machines not printing-related

Catch-all for semiconductor equipment outside statistical notes.

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Import Tips & Compliance

Include slurry flow rate and pad pressure specs for classification

Declare chemical handling systems separately if modular