Silicon Wafer Lapping Plate
Cast iron or copper lapping plate for flattening semiconductor wafers to precise tolerances during wafer preparation, as in statistical note (a)(ii)(C). Classifies under HTS 8431.49.90.94 as part of heading 8430 lapping machinery for semiconductor use.
Import Duty Rates by Country of Origin
Alternative Classifications
This product could be classified differently depending on its characteristics or intended use.
If sold as millstones or grinding wheels without machine dedication
Abrasive articles not principally for specific 8430 machines classify in Chapter 68.
If parts for general heading 8431 pumps or conveyors in wafer handling
If used in ancillary wafer transport systems, shifts within 8431 but different subheading.
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The Tariff Assistant works through the GRI rules on your specific product to reach the right HTS code — and can price the duty on it in the same conversation.
Import Tips & Compliance
• Certify flatness specs (e.g
• <1um) proving semiconductor application; include slurry compatibility details; avoid general abrasive plates under 6804
Related Products under HTS 8431.49.90.94
CMP Polisher Retaining Ring
Consumable retaining ring holding wafers in place during chemical-mechanical polishing for semiconductor devices.
Crystal Puller Seed Chuck Holder
Holder for seed crystal in Czochralski pullers initiating boule growth for semiconductor wafers.
Wafer Grinder Air Bearing
Air bearing spindle support for vibration-free grinding of semiconductor wafers.
Float Zone Puller Vacuum Chamber Lid
Sealable lid for vacuum chamber in float zone semiconductor crystal growth furnaces.
Czochralski Crystal Puller Furnace Chamber
The furnace chamber is a critical replaceable part for Czochralski crystal growers used in semiconductor wafer manufacturing, containing the high-temperature environment for pulling monocrystalline silicon boules. It falls under HTS 8431.49.90.94 as a part solely for machinery of heading 8429 (industrial ovens and furnaces). This statistical note component ensures precise crystal growth per semiconductor processing standards.
Float Zone Crystal Grower RF Heating Coil
RF heating coil used in float zone crystal pullers to melt and zone-refine semiconductor boules like silicon for ultra-pure wafers. Classified under HTS 8431.49.90.94 as a principal part for heading 8429 crystal growth furnaces in semiconductor manufacturing.