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Centrifuges, including centrifugal dryers; filtering or purifying machinery and apparatus, for liquids or gases; parts thereof: > Parts: > Other
Duty Rate (from China)
Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
Except as provided in headings 9903.88.05, 9903.88.06, 9903.88.07, 9903.88.08, 9903.88.10, 9903.88.11, 9903.88.14, 9903.88.19, 9903.88.50, 9903.88.52, 9903.88.58, 9903.88.60, 9903.88.62, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(a) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(b) [to this subchapter]
Subheadings
Products classified under HTS 8421.99.01
Solvent Recovery Centrifuge Drum
Drum assembly for centrifuges recovering PGMEA solvents from photoresist waste in semiconductor lithography areas. Parts of centrifuges for liquids in HTS 8421.99.01.
UF Water Filter Module Frame
Aluminum frame holding ultrafiltration membrane modules for ultrapure water production in semiconductor DI systems. Filtering apparatus part in HTS 8421.99.01.
Spin Dryer Impeller Assembly
High-speed impeller that directs airflow in wafer spin dryers for post-rinse drying in semiconductor lines. Part of centrifugal dryers under HTS 8421.99.01.
Process Gas coalescing Filter Bowl
Pressure vessel bowl collecting liquid aerosols from coalescing filters in semiconductor bulk gas lines. Gas filtering part per HTS 8421.99.01.
Photoresist Filter Head Assembly
Head connecting high-pressure photoresist filters in dispense systems for semiconductor lithography coaters. Liquid filtering apparatus part in HTS 8421.99.01.
Exhaust Gas Quencher Nozzle Array
Array of spray nozzles in gas quenching modules rapidly cooling reactive semiconductor process exhaust before purification. Part of gas purifying systems under HTS 8421.99.01.
Point-of-Use Gas Scrubber Tank
Containment tank for wet scrubbers neutralizing acid gases at point-of-use in semiconductor process tools. Part of gas purifying apparatus under HTS 8421.99.01.
Centrifugal Dryer Housing Assembly
This is the outer housing and structural assembly for industrial centrifugal dryers used in semiconductor wafer processing to remove liquids from wafers after rinsing. It falls under HTS 8421.99.01 as a part of centrifugal dryers, specifically designed for high-purity environments in chip manufacturing.
Wafer Filtering Pump Housing
A precision-machined housing for pumps in ultra-pure water filtering systems used in semiconductor wafer cleaning lines to purify process liquids. Classified under HTS 8421.99.01 as a part of filtering or purifying apparatus for liquids in high-tech manufacturing.
Gas Purifier Inlet Manifold
Stainless steel manifold that distributes process gases into point-of-use purifiers for removing impurities in semiconductor etching and deposition processes. It is a part of gas purifying apparatus under HTS 8421.99.01.
Centrifuge Rotor Bowl
The rotating bowl component of industrial centrifuges used for separating chemicals in semiconductor precursor preparation. Falls under HTS 8421.99.01 as a key part of centrifuges for liquids processing.
Liquid Filter Membrane Holder
Precision holder for replaceable membranes in inline filters purifying photoresist developers and cleaners for semiconductor wafers. A part of liquid filtering apparatus under HTS 8421.99.01.
Air Ionizer Filter Housing
Housing for HEPA filters in air purifying systems with ionizers for cleanroom environments in semiconductor fabs. Classified as part of gas filtering apparatus in HTS 8421.99.01.
Chemical Vapor Filter Cartridge Base
Base plate for replaceable cartridges in chemical vapor filters removing byproducts from semiconductor CVD exhaust gases. Part of purifying apparatus for gases per HTS 8421.99.01.
Wafer Rinse Centrifuge Basket
Perforated titanium basket that holds wafer carriers during high-speed spin-rinsing in semiconductor post-CMP cleaning. A centrifuge part under HTS 8421.99.01 for liquid removal.