Post-Saw Wafer Dryer

Industrial dryer specifically designed to remove cutting fluids from wafers immediately after slicing from crystal boules using heated nitrogen gas. HTS 8419.39.02 applies to this semiconductor-specific drying process involving temperature change.

Import Duty Rates by Country of Origin

Origin CountryMFN RateCh.99 SurchargesTotal Effective Rate
🇨🇳ChinaFree+35.0%35%
🇲🇽MexicoFree+10.0%10%
🇨🇦CanadaFree+10.0%10%
🇩🇪GermanyFree+10.0%10%
🇯🇵JapanFree+10.0%10%

More Specific Codes

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Alternative Classifications

This product could be classified differently depending on its characteristics or intended use.

8421.19.00.00Higher: 36.3% vs 35%

If

8486.20.00.00Lower: 25% vs 35%

If

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Import Tips & Compliance

Specify gas type (N2) and temperature ranges in technical specs

Include slurry composition compatibility documentation

Avoid general spin dryer classification by emphasizing fab integration

Related Products under HTS 8419.39.02

Czochralski Crystal Puller

A machine used to produce monocrystalline silicon boules by pulling a seed crystal from molten silicon in a controlled temperature environment. It falls under HTS 8419.39.02 as industrial drying equipment for semiconductor manufacturing processes involving precise temperature changes to evaporate impurities during crystal growth.

Float Zone Crystal Furnace

Industrial furnace employing float zone method to purify and grow semiconductor crystals through zone melting with RF heating and controlled cooling. Classified in 8419.39.02 for its drying and vaporizing processes during material treatment in semiconductor boule production.

Semiconductor Wafer Drying Oven

Precision oven for drying semiconductor wafers after wet processing steps, maintaining controlled low humidity and temperature to prevent contamination. Falls under HTS 8419.39.02 as specialized industrial dryer for temperature-controlled material treatment in chip fabrication.

Crystal Boule Grinder Dryer

Integrated system that grinds semiconductor crystal boules to precise diameter while simultaneously drying to remove grinding fluids and maintain surface quality. HTS 8419.39.02 covers this combined drying process essential for wafer preparation.

Wafer Edge Grind Dryer Station

Equipment for grinding wafer edges to specification followed by heated air drying to remove debris and liquids, critical for handling 300mm wafers without damage. Classified under 8419.39.02 for the temperature-controlled drying component in semiconductor processing.

Wafer Lapping Dryer Module

Modular drying unit attached to wafer lapping machines that evaporates lapping fluids using controlled hot air to achieve required flatness for device fabrication. Falls under 8419.39.02 as other industrial dryers for semiconductor material treatment.