Semiconductor Wafer Polisher Vacuum Pump

Vacuum pump component for chemical-mechanical wafer polishers preparing wafer surfaces for device fabrication. HTS 8414.90.91.80 per statistical note covering wafer polishers in preparation equipment. Achieves mirror finish critical for lithography processes.

Import Duty Rates by Country of Origin

Origin CountryMFN RateCh.99 SurchargesTotal Effective Rate
🇨🇳ChinaFree+35.0%35%
🇲🇽MexicoFree+10.0%10%
🇨🇦CanadaFree+10.0%10%
🇩🇪GermanyFree+10.0%10%
🇯🇵JapanFree+10.0%10%

Alternative Classifications

This product could be classified differently depending on its characteristics or intended use.

8421.19.00.00Higher: 36.3% vs 35%

If primary function is CMP slurry circulation

Centrifugal slurry pumps classified separately from vacuum functions

9031.49Lower: 10% vs 35%

If integrated in wafer flatness measuring systems

Measuring/testing apparatus parts in Chapter 90 per statistical note

Not sure which classification is right?

Our AI classifier can analyze your specific product and recommend the correct HTS code with confidence.

Import Tips & Compliance

CMP slurry compatibility certification with polisher specs

Provide incoming wafer thickness vs. post-polish tolerance data

Avoid generic CMP vac classification under 8414.90.50

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