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Tantalum Sputtering Target

Disk-shaped tantalum target for physical vapor deposition in semiconductor production. HTS 8103.99.00.00 includes this fabricated article used for thin-film coating. Pure tantalum ensures high-purity deposits.

Import Duty Rates by Country of Origin

Origin CountryMFN RateCh.99 SurchargesTotal Effective Rate
🇨🇳China4.4%—4.4%
🇲🇽Mexico4.4%—4.4%
🇨🇦Canada4.4%—4.4%
🇩🇪Germany4.4%—4.4%
🇯🇵Japan4.4%—4.4%

Alternative Classifications

This product could be classified differently depending on its characteristics or intended use.

8103.20.00Higher: 27.5% vs 4.4%

If doped with trace elements for specific deposition

Intentional alloying changes to alloy provisions per chapter notes.

8486.90.00.00Higher: 25% vs 4.4%

If mounted in vacuum deposition machines

Parts of semiconductor equipment classified in Chapter 84/85.

3818.00.00Higher: 50% vs 4.4%

If sold with chemical deposition compounds

Chemical preparations for deposition may take precedence.

Not sure which classification is right?

The Tariff Assistant works through the GRI rules on your specific product to reach the right HTS code — and can price the duty on it in the same conversation.

Import Tips & Compliance

• Include sputtering specs (diameter, purity) for verification

• End-use statements help but material form governs classification