Tantalum Sputtering Target

Disk-shaped tantalum target for physical vapor deposition in semiconductor production. HTS 8103.99.00.00 includes this fabricated article used for thin-film coating. Pure tantalum ensures high-purity deposits.

Import Duty Rates by Country of Origin

Origin CountryMFN RateCh.99 SurchargesTotal Effective Rate
🇨🇳China4.4%4.4%
🇲🇽Mexico4.4%4.4%
🇨🇦Canada4.4%4.4%
🇩🇪Germany4.4%4.4%
🇯🇵Japan4.4%4.4%

Alternative Classifications

This product could be classified differently depending on its characteristics or intended use.

8103.20.00Higher: 27.5% vs 4.4%

If doped with trace elements for specific deposition

Intentional alloying changes to alloy provisions per chapter notes.

8486.90.00.00Higher: 25% vs 4.4%

If mounted in vacuum deposition machines

Parts of semiconductor equipment classified in Chapter 84/85.

3818.00.00Higher: 50% vs 4.4%

If sold with chemical deposition compounds

Chemical preparations for deposition may take precedence.

Not sure which classification is right?

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Import Tips & Compliance

Include sputtering specs (diameter, purity) for verification

End-use statements help but material form governs classification