Tantalum Sputtering Target from Japan
Disk-shaped tantalum target for physical vapor deposition in semiconductor production. HTS 8103.99.00.00 includes this fabricated article used for thin-film coating. Pure tantalum ensures high-purity deposits.
Duty Rate — Japan → United States
4.4%
Rate breakdown
9903.05.860%Articles provided for in subdivision (b) of U.S. note 52 to this subchapter
Import Tips
• Include sputtering specs (diameter, purity) for verification
• End-use statements help but material form governs classification