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8103.99.00.00/Tantalum Sputtering Target/Mexico

Tantalum Sputtering Target from Mexico

Disk-shaped tantalum target for physical vapor deposition in semiconductor production. HTS 8103.99.00.00 includes this fabricated article used for thin-film coating. Pure tantalum ensures high-purity deposits.

Duty Rate — Mexico → United States

4.4%

Rate breakdown

9903.05.860%Universal product exemption (U.S. note 52(b))
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Import Tips

• Include sputtering specs (diameter, purity) for verification

• End-use statements help but material form governs classification

Tantalum Sputtering Target from Mexico — Import Duty Rate | HTS 8103.99.00.00