Tantalum Metal Powder for Sputtering Targets
Ultra-fine tantalum powder (particle size 1-10 microns) designed for plasma spraying and sputtering target production in semiconductor manufacturing. Classified under HTS 8103.20.00.90 as unwrought tantalum powder, not sintered or wrought into articles. It remains in raw powder form suitable for further processing.
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Alternative Classifications
This product could be classified differently depending on its characteristics or intended use.
If containing tungsten as primary alloy element
Per Chapter 81 notes, tantalum-tungsten alloys where tungsten exceeds tantalum content classify under tungsten heading 8101.
If in colloidal or suspension form
Tantalum powders suspended in liquids qualify as rare-earth compounds or inorganic preparations under Chapter 28.
If classified as ruthenium with tantalum impurities
If ruthenium content dominates (>99% per alloy note), it falls under 8112 for other base metals.
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Import Tips & Compliance
• Provide supplier's lot analysis confirming no sintering; customs may inspect for processing evidence
• Use nitrogen-purged containers to prevent ignition; comply with DOT hazardous material shipping rules
• Label with CAS number (7440-25-7) and UN proper shipping name for accurate entry summary
Related Products under HTS 8103.20.00.90
Tantalum Powder 99.9% Pure
High-purity tantalum powder (99.9% Ta) used in electronics and additive manufacturing, supplied in unwrought form as fine particles less than 100 microns. It falls under HTS 8103.20.00.90 as unwrought tantalum powder, distinct from sintered powders or wrought forms. This classification covers tantalum powders not further processed into bars or rods.
High-Purity Tantalum Granules
Tantalum granules (1-5mm irregular shapes) produced by gas atomization, used in capacitor manufacturing and powder metallurgy. This unwrought form fits HTS 8103.20.00.90 as 'other' tantalum powders and granules, excluding sintered rods. Granules are considered powder equivalents in unwrought state.
Tantalum Powder Tantalum-10W
Tantalum powder alloyed with 10% tungsten (Ta-90%, W-10%), used in high-temperature applications like aerospace components. Still classified under HTS 8103.20.00.90 as unwrought tantalum where Ta exceeds other elements per Chapter 81 alloy notes. Meets 'other' unwrought powder criteria.
Atomized Tantalum Powder -325 Mesh
Gas-atomized tantalum powder passing 325 mesh sieve (<44 microns), for thermal spraying and MIM (metal injection molding). HTS 8103.20.00.90 covers this unwrought powder form, not further sintered or shaped. Spherical morphology confirms raw production state.
Tantalum Flake Powder for Electronics
Flake-shaped tantalum powder (10-50 microns) optimized for electrolytic capacitor anodes. Falls under HTS 8103.20.00.90 as unwrought tantalum powder, valued for high surface area in electronics. Not sintered or wrought into components.
Ultra-Fine Tantalum Powder <1 Micron
Nanoscale tantalum powder (D50 <1 micron) for advanced coatings and catalysts. HTS 8103.20.00.90 applies to this unwrought, high-purity powder form. Particle size enables unique applications without further processing.