Tantalum Powder Tantalum-10W
Tantalum powder alloyed with 10% tungsten (Ta-90%, W-10%), used in high-temperature applications like aerospace components. Still classified under HTS 8103.20.00.90 as unwrought tantalum where Ta exceeds other elements per Chapter 81 alloy notes. Meets 'other' unwrought powder criteria.
Import Duty Rates by Country of Origin
Alternative Classifications
This product could be classified differently depending on its characteristics or intended use.
If tungsten content exceeds tantalum
Chapter 81 alloy rule: base metal is that exceeding all others by weight, moving to tungsten heading.
If processed into sintered forms
Wrought or sintered Ta-W alloys classify under 'other base metals' articles in 8112.
If prepared with binders for 3D printing
Powder mixtures with organic binders become chemical preparations under Chapter 38.
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Import Tips & Compliance
• Provide XRF/ICP analysis proving Ta >99% of non-Ta metals to stay in 8103; higher W shifts heading
• Declare alloy composition precisely to avoid misclassification as tungsten-base under 8101
• Monitor for EU REACH compliance if transshipping, as affects US entry docs
Related Products under HTS 8103.20.00.90
Tantalum Powder 99.9% Pure
High-purity tantalum powder (99.9% Ta) used in electronics and additive manufacturing, supplied in unwrought form as fine particles less than 100 microns. It falls under HTS 8103.20.00.90 as unwrought tantalum powder, distinct from sintered powders or wrought forms. This classification covers tantalum powders not further processed into bars or rods.
Tantalum Metal Powder for Sputtering Targets
Ultra-fine tantalum powder (particle size 1-10 microns) designed for plasma spraying and sputtering target production in semiconductor manufacturing. Classified under HTS 8103.20.00.90 as unwrought tantalum powder, not sintered or wrought into articles. It remains in raw powder form suitable for further processing.
High-Purity Tantalum Granules
Tantalum granules (1-5mm irregular shapes) produced by gas atomization, used in capacitor manufacturing and powder metallurgy. This unwrought form fits HTS 8103.20.00.90 as 'other' tantalum powders and granules, excluding sintered rods. Granules are considered powder equivalents in unwrought state.
Atomized Tantalum Powder -325 Mesh
Gas-atomized tantalum powder passing 325 mesh sieve (<44 microns), for thermal spraying and MIM (metal injection molding). HTS 8103.20.00.90 covers this unwrought powder form, not further sintered or shaped. Spherical morphology confirms raw production state.
Tantalum Flake Powder for Electronics
Flake-shaped tantalum powder (10-50 microns) optimized for electrolytic capacitor anodes. Falls under HTS 8103.20.00.90 as unwrought tantalum powder, valued for high surface area in electronics. Not sintered or wrought into components.
Ultra-Fine Tantalum Powder <1 Micron
Nanoscale tantalum powder (D50 <1 micron) for advanced coatings and catalysts. HTS 8103.20.00.90 applies to this unwrought, high-purity powder form. Particle size enables unique applications without further processing.