High-Purity Tantalum Granules

Tantalum granules (1-5mm irregular shapes) produced by gas atomization, used in capacitor manufacturing and powder metallurgy. This unwrought form fits HTS 8103.20.00.90 as 'other' tantalum powders and granules, excluding sintered rods. Granules are considered powder equivalents in unwrought state.

Import Duty Rates by Country of Origin

Origin CountryMFN RateCh.99 SurchargesTotal Effective Rate
🇨🇳China2.5%+25.0%27.5%
🇲🇽Mexico2.5%2.5%
🇨🇦Canada2.5%2.5%
🇩🇪Germany2.5%2.5%
🇯🇵Japan2.5%2.5%

Alternative Classifications

This product could be classified differently depending on its characteristics or intended use.

8103.20.00Same rate: 27.5%

If in bars or rods simply sintered

Sintered tantalum forms consolidated into bars/rods move to the sintered subheading, not loose granules.

2616.90.00Higher: 35% vs 27.5%

If derived from ore processing residues

Tantalum-bearing concentrates or intermediate powders from mining classify under Chapter 26 slag/ash.

7202.99Lower: 15% vs 27.5%

If ferro-tantalum alloy

Ferrous alloys containing tantalum fall under Chapter 72 iron/steel ferroalloys.

Not sure which classification is right?

Our AI classifier can analyze your specific product and recommend the correct HTS code with confidence.

Import Tips & Compliance

Submit granulometry report (sieve analysis) to prove unwrought status versus sintered bars

Ensure vacuum-sealed packaging; exposure to air can cause reclassification if oxidized

Cross-check with CBP for 'powder' definition; granules under 10mm typically qualify

Related Products under HTS 8103.20.00.90

Tantalum Powder 99.9% Pure

High-purity tantalum powder (99.9% Ta) used in electronics and additive manufacturing, supplied in unwrought form as fine particles less than 100 microns. It falls under HTS 8103.20.00.90 as unwrought tantalum powder, distinct from sintered powders or wrought forms. This classification covers tantalum powders not further processed into bars or rods.

Tantalum Metal Powder for Sputtering Targets

Ultra-fine tantalum powder (particle size 1-10 microns) designed for plasma spraying and sputtering target production in semiconductor manufacturing. Classified under HTS 8103.20.00.90 as unwrought tantalum powder, not sintered or wrought into articles. It remains in raw powder form suitable for further processing.

Tantalum Powder Tantalum-10W

Tantalum powder alloyed with 10% tungsten (Ta-90%, W-10%), used in high-temperature applications like aerospace components. Still classified under HTS 8103.20.00.90 as unwrought tantalum where Ta exceeds other elements per Chapter 81 alloy notes. Meets 'other' unwrought powder criteria.

Atomized Tantalum Powder -325 Mesh

Gas-atomized tantalum powder passing 325 mesh sieve (<44 microns), for thermal spraying and MIM (metal injection molding). HTS 8103.20.00.90 covers this unwrought powder form, not further sintered or shaped. Spherical morphology confirms raw production state.

Tantalum Flake Powder for Electronics

Flake-shaped tantalum powder (10-50 microns) optimized for electrolytic capacitor anodes. Falls under HTS 8103.20.00.90 as unwrought tantalum powder, valued for high surface area in electronics. Not sintered or wrought into components.

Ultra-Fine Tantalum Powder <1 Micron

Nanoscale tantalum powder (D50 <1 micron) for advanced coatings and catalysts. HTS 8103.20.00.90 applies to this unwrought, high-purity powder form. Particle size enables unique applications without further processing.