Tantalum Metal Powder for Sputtering Targets from China
Ultra-fine tantalum powder (particle size 1-10 microns) designed for plasma spraying and sputtering target production in semiconductor manufacturing. Classified under HTS 8103.20.00.90 as unwrought tantalum powder, not sintered or wrought into articles. It remains in raw powder form suitable for further processing.
Duty Rate — China → United States
27.5%
Rate breakdown
9903.91.0125%Effective with respect to entries on or after September 27, 2024, articles the product of China, as provided for in subdivision (b) of U.S. note 31 to this subchapter
9903.03.030%Articles the product of any country, as provided for in subdivision (aa)(ii) of U.S. note 2 to this subchapter
Import Tips
• Provide supplier's lot analysis confirming no sintering; customs may inspect for processing evidence
• Use nitrogen-purged containers to prevent ignition; comply with DOT hazardous material shipping rules
• Label with CAS number (7440-25-7) and UN proper shipping name for accurate entry summary