HBFC Plasma Etching Gas Mixture
Plasma etching gas blend with HBFC-236ea (CF3CH2CF2Br) for semiconductor wafer fabrication. HTS 3827.12.00.00 due to HBFC as reactive halogenated component in process gas mixture. Essential for 3D NAND flash memory production.
Import Duty Rates by Country of Origin
Alternative Classifications
This product could be classified differently depending on its characteristics or intended use.
If certified semiconductor diagnostic reagent
Gases qualified for equipment calibration/diagnostics classify as lab reagents.
If rare gas mixtures
Significant rare gas content shifts to other inorganic chemical compounds.
If waste from semiconductor production
Exhausted process gases containing HBFCs classify as chemical production wastes.
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Import Tips & Compliance
• Submit TSCA PMN (Premanufacture Notice) for new semiconductor process gases containing HBFCs
• Include wafer etch rate specifications proving superior selectivity vs HFC alternatives
• Document as 'process gas' not compressed gas to avoid Chapter 28 pure gas classification
Related Products under HTS 3827.12.00.00
HBFC-123B1 Fire Suppressant Mixture
A specialized fire suppression blend containing hydrobromofluorocarbon HBFC-123B1 (C2HBrF4) mixed with inert propellants for use in clean agent fire extinguishers. This mixture falls under HTS 3827.12.00.00 because it primarily contains HBFCs, which are halogenated derivatives of ethane used in controlled industrial applications. It is subject to strict import regulations due to ozone-depleting properties.
HBFC-225ca Cleaning Solvent Blend
Industrial precision cleaning formulation with HBFC-225ca (CF3CHFBrCF2CF3) combined with co-solvents for electronics manufacturing degreasing. Classified under 3827.12.00.00 due to dominant HBFC content as halogenated derivative mixtures not elsewhere specified. Used where CFC/HCFC alternatives fail performance requirements.
HBFC Foam Blowing Agent Concentrate
Concentrated HBFC-243db1 (CF3CHBrCF2CH2F) formulation for rigid polyurethane foam expansion in aerospace applications. Classified in 3827.12.00.00 as HBFC mixture for chemical processing. Exempt from most bans due to critical defense specifications.
Medical Sterilant HBFC Gas Mixture
HBFC-132b (CHBrFCH2F) gas blend with carrier gases for ethylene oxide alternative sterilization in medical device manufacturing. HTS 3827.12.00.00 classification due to HBFC as principal halogenated component. Used for heat-sensitive surgical instruments.
HBFC-124B1 Precision Vapor Degreaser
Vapor degreasing fluid containing HBFC-124B1 (CHBrF-CClF2) for cleaning optical components and semiconductors. Falls under 3827.12.00.00 as mixture of halogenated ethane derivatives with HBFC character. Critical for non-aqueous precision cleaning.
Aerospace HBFC Hydraulic Fluid Additive
HBFC-enhanced hydraulic fluid concentrate for extreme temperature aircraft systems containing HBFC-227ea derivatives. Classified 3827.12.00.00 due to functional HBFC component in halogenated mixture. Meets MIL-PRF-83282D specifications.