Quartz Ingot for Photomask Substrates
Synthetic quartz crystal ingot (fused silica) grown hydrothermally, exceeding 2.5g weight, for EUV photomask blanks in chip fabrication. HTS 3824.99.1100 for cultured non-optical crystals in ingot form. Ultra-low thermal expansion coefficient critical for nanometer precision lithography.
Import Duty Rates by Country of Origin
| Origin Country | MFN Rate | Ch.99 Surcharges | Total Effective Rate |
|---|---|---|---|
| 🇨🇳China | Free | +35.0% | 35% |
| 🇲🇽Mexico | Free | +10.0% | 10% |
| 🇨🇦Canada | Free | +10.0% | 10% |
| 🇩🇪Germany | Free | +10.0% | 10% |
| 🇯🇵Japan | Free | +10.0% | 10% |
Alternative Classifications
This product could be classified differently depending on its characteristics or intended use.
If natural quartz crystals
Untreated natural quartz falls under Chapter 25 mineral products.
If ground and polished into optical blanks
Finished optical components classify in Chapter 90.
If drawn or blown into glass tubes/rods
Amorphous fused silica processes to Chapter 70 glass articles.
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Import Tips & Compliance
• Include OH content and inclusion density specs proving synthetic cultured origin vs. natural quartz
• Weight certification mandatory; ingots must individually exceed 2.5g threshold
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