Quartz Ingot for Photomask Substrates from China
Synthetic quartz crystal ingot (fused silica) grown hydrothermally, exceeding 2.5g weight, for EUV photomask blanks in chip fabrication. HTS 3824.99.1100 for cultured non-optical crystals in ingot form. Ultra-low thermal expansion coefficient critical for nanometer precision lithography.
Duty Rate — China → United States
37.5%
Rate breakdown
9903.88.0325%Except as provided in headings 9903.88.13, 9903.88.18, 9903.88.33, 9903.88.34, 9903.88.35, 9903.88.36, 9903.88.37, 9903.88.38, 9903.88.40, 9903.88.41, 9903.88.43, 9903.88.45, 9903.88.46, 9903.88.48, 9903.88.56, 9903.88.64, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(e) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(f)
9903.05.3112.5%Section 301 (forced labor) — additional 12.5% ad valorem on products of China
Import Tips
• Include OH content and inclusion density specs proving synthetic cultured origin vs. natural quartz
• Weight certification mandatory; ingots must individually exceed 2.5g threshold