Quartz Ingot for Photomask Substrates from Germany
Synthetic quartz crystal ingot (fused silica) grown hydrothermally, exceeding 2.5g weight, for EUV photomask blanks in chip fabrication. HTS 3824.99.1100 for cultured non-optical crystals in ingot form. Ultra-low thermal expansion coefficient critical for nanometer precision lithography.
Duty Rate — Germany → United States
10%
Rate breakdown
9903.05.3910%Except for products described in headings 9903.05.85–9903.05.92 and 9903.05.97, articles the product of a member state of the European Union, with an ad valorem (or ad valorem equivalent) rate of duty under column 1 less than 10 percent, as provided for in U.S. note 52 to this subchapter
Import Tips
• Include OH content and inclusion density specs proving synthetic cultured origin vs. natural quartz
• Weight certification mandatory; ingots must individually exceed 2.5g threshold