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Cobalt Oxide Sputtering Target

High-purity cobalt oxide formed into sputtering targets for thin-film deposition in electronics. As chemically defined cobalt oxide, it is 'other' under 2822.00.00.90.

Import Duty Rates by Country of Origin

Origin CountryMFN RateCh.99 SurchargesTotal Effective Rate
🇨🇳China0.1%+25.0%25.1%
🇲🇽Mexico0.1%0.1%
🇨🇦Canada0.1%0.1%
🇩🇪Germany0.1%0.1%
🇯🇵Japan0.1%0.1%

Alternative Classifications

This product could be classified differently depending on its characteristics or intended use.

3818.00.00Higher: 50% vs 25.1%

If doped for semiconductors

Doped chemical elements in disc/wafer forms excluded to 3818.

8543.70Lower: 12.6% vs 25.1%

If assembled into electronic article

Finished electrical devices containing cobalt oxide to Chapter 85.

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Import Tips & Compliance

Declare as 'not doped' to stay in Chapter 28; doped goes to 3818

Include vacuum packaging details for valuation

Customs may require end-use verification for high-tech imports