Cobalt Oxide Sputtering Target from Japan
High-purity cobalt oxide formed into sputtering targets for thin-film deposition in electronics. As chemically defined cobalt oxide, it is 'other' under 2822.00.00.90.
Duty Rate — Japan → United States
0.1%
Rate breakdown
9903.03.030%Articles the product of any country, as provided for in subdivision (aa)(ii) of U.S. note 2 to this subchapter
Import Tips
• Declare as 'not doped' to stay in Chapter 28; doped goes to 3818
• Include vacuum packaging details for valuation
• Customs may require end-use verification for high-tech imports