Cobalt Oxide Sputtering Target from Germany
High-purity cobalt oxide formed into sputtering targets for thin-film deposition in electronics. As chemically defined cobalt oxide, it is 'other' under 2822.00.00.90.
Duty Rate — Germany → United States
0.1%
Rate breakdown
9903.05.860%Universal product exemption (U.S. note 52(b))
Import Tips
• Declare as 'not doped' to stay in Chapter 28; doped goes to 3818
• Include vacuum packaging details for valuation
• Customs may require end-use verification for high-tech imports