Cobalt Oxide Sputtering Target from China

High-purity cobalt oxide formed into sputtering targets for thin-film deposition in electronics. As chemically defined cobalt oxide, it is 'other' under 2822.00.00.90.

Duty Rate — China → United States

25.1%

Rate breakdown

9903.88.0325%Except as provided in headings 9903.88.13, 9903.88.18, 9903.88.33, 9903.88.34, 9903.88.35, 9903.88.36, 9903.88.37, 9903.88.38, 9903.88.40, 9903.88.41, 9903.88.43, 9903.88.45, 9903.88.46, 9903.88.48, 9903.88.56, 9903.88.64, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(e) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(f)
9903.03.030%Articles the product of any country, as provided for in subdivision (aa)(ii) of U.S. note 2 to this subchapter

Import Tips

Declare as 'not doped' to stay in Chapter 28; doped goes to 3818

Include vacuum packaging details for valuation

Customs may require end-use verification for high-tech imports