Chromium Oxide Sputtering Target

High-purity chromium oxide targets used for thin-film deposition in semiconductor manufacturing. Classified under HTS 2819.90.00.00 as chemically defined chromium oxide in unworked form.

Import Duty Rates by Country of Origin

Origin CountryMFN RateCh.99 SurchargesTotal Effective Rate
🇨🇳China3.7%+35.0%38.7%
🇲🇽Mexico3.7%+10.0%13.7%
🇨🇦Canada3.7%+10.0%13.7%
🇩🇪Germany3.7%+10.0%13.7%
🇯🇵Japan3.7%+10.0%13.7%

Alternative Classifications

This product could be classified differently depending on its characteristics or intended use.

3818.00.00Higher: 50% vs 38.7%

If when doped for semiconductor fabrication

Chemically doped metal oxides for electronics fall under heading 3818 per Chapter notes.

8543.70Lower: 12.6% vs 38.7%

If as electrical machines or apparatus parts

Fabricated sputtering equipment components are classified by function in Chapter 85.

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Import Tips & Compliance

Provide 99.9%+ purity certificates and vacuum packaging verification for cleanroom compatibility

Declare target dimensions and bonding method (if any) to confirm unworked status

Comply with ITAR/EAR if targets incorporate controlled technology