Chromium Oxide Sputtering Target from China
High-purity chromium oxide targets used for thin-film deposition in semiconductor manufacturing. Classified under HTS 2819.90.00.00 as chemically defined chromium oxide in unworked form.
Duty Rate — China → United States
41.2%
Rate breakdown
9903.05.3112.5%Except for products described in headings 9903.05.85–9903.05.92, articles the product of China, as provided for in U.S. note 52 to this subchapter
9903.88.0325%Except as provided in headings 9903.88.13, 9903.88.18, 9903.88.33, 9903.88.34, 9903.88.35, 9903.88.36, 9903.88.37, 9903.88.38, 9903.88.40, 9903.88.41, 9903.88.43, 9903.88.45, 9903.88.46, 9903.88.48, 9903.88.56, 9903.88.64, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(e) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(f)
Import Tips
• Provide 99.9%+ purity certificates and vacuum packaging verification for cleanroom compatibility
• Declare target dimensions and bonding method (if any) to confirm unworked status
• Comply with ITAR/EAR if targets incorporate controlled technology