Chromium Oxide Sputtering Target from Japan
High-purity chromium oxide targets used for thin-film deposition in semiconductor manufacturing. Classified under HTS 2819.90.00.00 as chemically defined chromium oxide in unworked form.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Except for products described in headings 9903.05.85–9903.05.92, articles the product of Japan, with an ad valorem (or ad valorem equivalent) rate of duty under column 1 less than 12.5 percent, as provided for in U.S. note 52 to this subchapter
Import Tips
• Provide 99.9%+ purity certificates and vacuum packaging verification for cleanroom compatibility
• Declare target dimensions and bonding method (if any) to confirm unworked status
• Comply with ITAR/EAR if targets incorporate controlled technology