Chromium Oxide Sputtering Target from Japan
High-purity chromium oxide targets used for thin-film deposition in semiconductor manufacturing. Classified under HTS 2819.90.00.00 as chemically defined chromium oxide in unworked form.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%
Import Tips
• Provide 99.9%+ purity certificates and vacuum packaging verification for cleanroom compatibility
• Declare target dimensions and bonding method (if any) to confirm unworked status
• Comply with ITAR/EAR if targets incorporate controlled technology