2819.90.00.00/Chromium Oxide Sputtering Target/Mexico

Chromium Oxide Sputtering Target from Mexico

High-purity chromium oxide targets used for thin-film deposition in semiconductor manufacturing. Classified under HTS 2819.90.00.00 as chemically defined chromium oxide in unworked form.

Duty Rate — Mexico → United States

13.7%

Rate breakdown

9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
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Import Tips

• Provide 99.9%+ purity certificates and vacuum packaging verification for cleanroom compatibility

• Declare target dimensions and bonding method (if any) to confirm unworked status

• Comply with ITAR/EAR if targets incorporate controlled technology

Chromium Oxide Sputtering Target from Mexico — Import Duty Rate | HTS 2819.90.00.00