For inspecting semiconductor wafers or devices (including integrated circuits) or for inspecting photomasks or reticles used in manufacturing semiconductor devices (including integrated circuits)
Instruments and apparatus for physical or chemical analysis (for example, polarimeters, refractometers, spectrometers, gas or smoke analysis apparatus); instruments and apparatus for measuring or checking viscosity, porosity, expansion, surface tension or the like; instruments and apparatus for measuring or checking quantities of heat, sound or light (including exposure meters); microtomes. > Other optical instruments and appliances: > For inspecting semiconductor wafers or devices (including integrated circuits) or for inspecting photomasks or reticles used in manufacturing semiconductor devices (including integrated circuits) > For inspecting semiconductor wafers or devices (including integrated circuits) or for inspecting photomasks or reticles used in manufacturing semiconductor devices (including integrated circuits) > For inspecting semiconductor wafers or devices (including integrated circuits) or for inspecting photomasks or reticles used in manufacturing semiconductor devices (including integrated circuits)
Duty Rate (from China)
Products classified under Tariff item 9031.41.00.00
Applied Materials UVision 4E Patterned Wafer Inspector
A high-resolution patterned wafer inspection tool that uses deep ultraviolet (DUV) optics to detect systematic and random defects on production wafers. This instrument is essential for yield enhancement in advanced semiconductor nodes below 10nm, and it falls under tariff item 9031.41.00 as it is specifically designed for inspecting semiconductor wafers.
9031.41.00Applied Materials Verifier Summit Reticle Inspector
A high-throughput reticle inspection platform using deep ultraviolet (DUV) illumination for detecting critical defects on advanced node photomasks. Features programmable defect classification and recipe-based inspection tasks, and is classified under tariff item 9031.41.00.
9031.41.00ASML YieldStar Optical Metrology Tool
An overlay and focus metrology system for semiconductor wafers using diffraction-based optical measurements to ensure lithographic pattern accuracy. Used post-exposure to monitor process control in high-volume manufacturing, this tool is classified under 9031.41.00 as it inspects semiconductor wafers.
9031.41.00BrightSpot Automation OWL Reticle Inspector
A programmable illumination reticle inspection system for photomask qualification using multiple wavelength sources and aerial image sensor technology. Used in semiconductor mask houses, this instrument is designed for inspecting photomasks or reticles, placing it under tariff item 9031.41.00.
9031.41.00Bruker ContourGT Reticle Surface Profiler
A white light interferometric surface profiler optimized for measuring photomask blank surface roughness and topography critical for defect printability analysis. Sub-angstrom resolution meets semiconductor reticle specifications, and this instrument falls under tariff item 9031.41.00.
9031.41.00Camtek Eagle i 3D Wafer Metrology System
An advanced packaging 3D metrology tool combining optical profilometry and color interferometry for micro-bump inspection on semiconductor wafers. Critical for heterogeneous integration processes, this system inspects semiconductor wafers and falls under tariff item 9031.41.00.
9031.41.00Hitachi NSX Series Reticle Inspection System
A die-to-database reticle inspection system using transmitted and reflected light optics for photomask defect detection in semiconductor lithography. Critical for ensuring mask quality in leading-edge chip production, this instrument is classified under 9031.41.00 for inspecting photomasks.
9031.41.00KLA-Tencor 2935 Wafer Inspection System
An automated optical inspection system designed for detecting defects on unpatterned semiconductor wafers during manufacturing. It uses laser scanning and advanced imaging to inspect wafer surfaces for particles, scratches, and other defects, placing it under tariff item 9031.41.00.
9031.41.00KLA-Tencor 8950E Patterned Wafer Inspector
A high-volume production patterned wafer inspection system with simultaneous frontside/backside inspection capability using programmable illumination. Detects defects down to 40nm, and is classified under tariff item 9031.41.00 as it inspects semiconductor wafers.
9031.41.00KLA-Tencor Surfscan SP7 Unpatterned Wafer Scanner
A surface scanning system for bare silicon wafer defectivity mapping using multi-angle darkfield optics and UV laser excitation. Detects haze, flatness deviations, and particles down to 20nm, and is specifically for semiconductor wafer inspection, falling under tariff item 9031.41.00.
9031.41.00Lasertec M5650 EUV Blank Inspection System
An extreme ultraviolet (EUV) blank inspection system using actinic wavelength optics for multilayer defect detection on EUV photomasks. Essential for 3nm and below semiconductor nodes, this instrument is classified under tariff item 9031.41.00 for inspecting photomasks.
9031.41.00Nanotronics NVAid Automated Wafer Inspector
An AI-powered wafer inspection platform combining brightfield, darkfield, and review SEM capabilities for comprehensive defect classification. Used in semiconductor fabs for process monitoring and yield analytics, this system falls under tariff item 9031.41.00 as it inspects semiconductor wafers.
9031.41.00Nova V-R series OCD Metrology Tool
An Optical Critical Dimension (OCD) scatterometry system for semiconductor wafer film thickness and profile measurement using spectroscopic ellipsometry. Non-destructive process control for advanced nodes, this tool is classified under tariff item 9031.41.00 for inspecting semiconductor wafers.
9031.41.00Onto Innovation Firefly NDT Wafer Defect Review System
A high-throughput noise defect termination system for patterned wafer review using broadband plasma illumination and programmable apertures. Automates defect classification for semiconductor process control, and falls under tariff item 9031.41.00 as it inspects semiconductor wafers.
9031.41.00Toray Engineering CIRCL-100 Photomask Inspector
A programmable spatial frequency response inspection system for binary and phase-shift photomasks using aerial image simulation technology. Ensures photomask CD uniformity and defect-free patterns for semiconductor production, placing it under tariff item 9031.41.00.