Onto Innovation Firefly NDT Wafer Defect Review System
A high-throughput noise defect termination system for patterned wafer review using broadband plasma illumination and programmable apertures. Automates defect classification for semiconductor process control, and falls under tariff item 9031.41.00 as it inspects semiconductor wafers.
Import Duty Rates by Country of Origin
| Origin Country | MFN Tariff | Surtaxes | Total Effective Rate |
|---|---|---|---|
| 🇨🇳China | Free | — | Free |
| 🇲🇽Mexico | Free | — | Free |
| 🇺🇸United States | Free | — | Free |
| 🇩🇪Germany | Free | — | Free |
| 🇯🇵Japan | Free | — | Free |
More Specific Codes
This product may fall under a more specific subheading:
Alternative Classifications
This product could be classified differently depending on its characteristics or intended use.
If used for non-semiconductor wafer review.
Other optical inspection instruments fall under this item.
If the review involves non-optical methods.
Other measuring or checking instruments not specifically optical.
Not sure which classification is right?
The Tariff Assistant works through the GRI rules on your specific product to reach the right tariff item — and can price the duty on it in the same conversation.
Import Tips & Compliance
• Ensure the system is used for semiconductor wafer inspection
• Provide CBSA with technical documentation and usage details
• Consider pre-arrival customs review for specialized equipment
Related Products under Tariff item 9031.41.00
Applied Materials UVision 4E Patterned Wafer Inspector
A high-resolution patterned wafer inspection tool that uses deep ultraviolet (DUV) optics to detect systematic and random defects on production wafers. This instrument is essential for yield enhancement in advanced semiconductor nodes below 10nm, and it falls under tariff item 9031.41.00 as it is specifically designed for inspecting semiconductor wafers.
Applied Materials Verifier Summit Reticle Inspector
A high-throughput reticle inspection platform using deep ultraviolet (DUV) illumination for detecting critical defects on advanced node photomasks. Features programmable defect classification and recipe-based inspection tasks, and is classified under tariff item 9031.41.00.
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A programmable illumination reticle inspection system for photomask qualification using multiple wavelength sources and aerial image sensor technology. Used in semiconductor mask houses, this instrument is designed for inspecting photomasks or reticles, placing it under tariff item 9031.41.00.
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