Toray Engineering CIRCL-100 Photomask Inspector
A programmable spatial frequency response inspection system for binary and phase-shift photomasks using aerial image simulation technology. Ensures photomask CD uniformity and defect-free patterns for semiconductor production, placing it under tariff item 9031.41.00.
Import Duty Rates by Country of Origin
| Origin Country | MFN Tariff | Surtaxes | Total Effective Rate |
|---|---|---|---|
| 🇨🇳China | Free | — | Free |
| 🇲🇽Mexico | Free | — | Free |
| 🇺🇸United States | Free | — | Free |
| 🇩🇪Germany | Free | — | Free |
| 🇯🇵Japan | Free | — | Free |
More Specific Codes
This product may fall under a more specific subheading:
Alternative Classifications
This product could be classified differently depending on its characteristics or intended use.
If used for non-semiconductor photomasks.
Other optical inspection instruments fall under this item.
If used for projecting circuit patterns.
Apparatus for the projection or drawing of circuit patterns on sensitized materials.
Not sure which classification is right?
The Tariff Assistant works through the GRI rules on your specific product to reach the right tariff item — and can price the duty on it in the same conversation.
Import Tips & Compliance
• Verify the system is used for semiconductor photomask inspection
• Provide CBSA with technical specifications and intended use
• Consult with a customs broker for proper classification
Related Products under Tariff item 9031.41.00
Applied Materials UVision 4E Patterned Wafer Inspector
A high-resolution patterned wafer inspection tool that uses deep ultraviolet (DUV) optics to detect systematic and random defects on production wafers. This instrument is essential for yield enhancement in advanced semiconductor nodes below 10nm, and it falls under tariff item 9031.41.00 as it is specifically designed for inspecting semiconductor wafers.
Applied Materials Verifier Summit Reticle Inspector
A high-throughput reticle inspection platform using deep ultraviolet (DUV) illumination for detecting critical defects on advanced node photomasks. Features programmable defect classification and recipe-based inspection tasks, and is classified under tariff item 9031.41.00.
ASML YieldStar Optical Metrology Tool
An overlay and focus metrology system for semiconductor wafers using diffraction-based optical measurements to ensure lithographic pattern accuracy. Used post-exposure to monitor process control in high-volume manufacturing, this tool is classified under 9031.41.00 as it inspects semiconductor wafers.
BrightSpot Automation OWL Reticle Inspector
A programmable illumination reticle inspection system for photomask qualification using multiple wavelength sources and aerial image sensor technology. Used in semiconductor mask houses, this instrument is designed for inspecting photomasks or reticles, placing it under tariff item 9031.41.00.
Bruker ContourGT Reticle Surface Profiler
A white light interferometric surface profiler optimized for measuring photomask blank surface roughness and topography critical for defect printability analysis. Sub-angstrom resolution meets semiconductor reticle specifications, and this instrument falls under tariff item 9031.41.00.
Camtek Eagle i 3D Wafer Metrology System
An advanced packaging 3D metrology tool combining optical profilometry and color interferometry for micro-bump inspection on semiconductor wafers. Critical for heterogeneous integration processes, this system inspects semiconductor wafers and falls under tariff item 9031.41.00.