Toray Engineering CIRCL-100 Photomask Inspector from Mexico
A programmable spatial frequency response inspection system for binary and phase-shift photomasks using aerial image simulation technology. Ensures photomask CD uniformity and defect-free patterns for semiconductor production, falling under 9031.41.00 as it inspects photomasks or reticles.
Duty Rate — Mexico → Canada
0%
Import Tips
• Declare under 9031.41.00 as an optical instrument for inspecting semiconductor photomasks
• Provide technical manuals to demonstrate its specific use
• Check for duty-free entry under trade agreements