Chapter 8417 — Customs Tariff Headings
Subheadings
Products classified under Tariff item 84.17
Copper Ore Smelting Furnace
A blast furnace designed specifically for smelting copper ores by applying intense heat to melt the ore and extract copper matte. This furnace is essential in primary metal production and falls under tariff item 8417.10.00 as it is used for the melting and heat-treatment of ores and metals.
8417.10.00Ore Roasting Furnace
An industrial furnace designed for roasting metal ores, such as copper pyrite, at high temperatures to remove sulfur and other impurities before smelting. This process is a key step in ore beneficiation and aligns directly with the scope of tariff item 8417.10.00.
8417.10.00Pyrite Calcining Rotary Furnace
A rotary kiln furnace used for calcining pyrites, a process that involves heating the ore to drive off sulfur and produce metal oxides. This furnace is specifically designed for the heat-treatment of pyrites, making it classifiable under tariff item 8417.10.00.
8417.20.00Convection Bakery Oven
A gas-powered convection bakery oven that circulates hot air with fans to ensure even baking of cakes, muffins, and other goods in commercial bakeries. It is non-electric, relying on gas burners for heat, and is designed specifically for bakery products, qualifying under tariff item 8417.20.00 as a bakery oven.
8417.20.00Deck Bakery Oven
A multi-deck non-electric oven with stone or steel decks, designed for artisan bread baking with precise temperature control for crust development. It is a specialized bakery oven, falling under tariff item 8417.20.00 as a non-electric bakery oven.
8417.20.00Gas-Fired Biscuit Oven
A continuous tunnel-style non-electric oven optimized for high-volume baking of biscuits and cookies, using natural gas burners for even heat distribution. It is explicitly a biscuit oven, falling under tariff item 8417.20.00 which includes biscuit ovens.
8417.20.00Industrial Pastry Oven
A rack-style non-electric oven designed for delicate pastries, offering precise humidity and temperature control in professional patisseries. It is a bakery oven for pastry products, falling under tariff item 8417.20.00 as a non-electric bakery oven.
8417.20.00Industrial Rack Oven for Bakeries
A large-capacity non-electric rack oven designed for baking bread, pastries, and other bakery products in commercial settings, using gas or oil combustion for heating. It is a bakery oven, falling under tariff item 8417.20.00 as a non-electric bakery oven.
8417.20.00Pizza Deck Oven
A high-temperature non-electric deck oven designed for baking pizzas and flatbreads in pizzeria operations, considered a bakery oven variant. It falls under tariff item 8417.20.00 as a non-electric bakery oven for baking products.
8417.20.00Proofing and Baking Combo Oven
A non-electric combination unit with a proofing cabinet and baking chamber for dough rising and baking in one system, primarily for bakery use. It falls under tariff item 8417.20.00 as a non-electric bakery oven when the baking function predominates.
8417.20.00Roll-In Bakery Oven
A large non-electric oven that accepts rolling rack carts for efficient loading of bread trays in commercial bakeries. It is a specialized bakery oven, falling under tariff item 8417.20.00 as a non-electric bakery oven.
8417.20.00Rotary Tray Bakery Oven
A non-electric rotary oven with revolving trays for uniform baking of rolls and pastries in high-output bakery environments. It is a bakery oven, falling under tariff item 8417.20.00 as a non-electric bakery oven.
8417.20.00Tunnel Bread Oven
A continuous non-electric tunnel oven for mass production of bread loaves, featuring conveyor systems through multi-zone heating. It is specifically a bakery oven, falling under tariff item 8417.20.00 as a non-electric bakery oven.
8417.80.00Crystal Ingot Anneal Furnace
An industrial non-electric furnace used to anneal semiconductor crystal ingots after growth. It minimizes dislocation density and stabilizes resistivity profiles through slow, controlled ramp rates over extended periods in a vertical configuration.
8417.80.00Czochralski Crystal Puller Furnace
A non-electric industrial furnace that uses the Czochralski method to grow monocrystalline silicon boules from molten semiconductor material. It maintains precise temperature gradients in a vacuum to produce crystals for subsequent wafer slicing.
8417.80.00Float Zone Crystal Growth Furnace
A non-electric furnace that uses the float zone method to purify and grow monocrystalline semiconductor rods, particularly silicon, by melting a narrow zone with RF heating in a vacuum chamber. It is critical for producing ultra-high-purity crystals.
8417.80.00Hydrogen Bake Furnace
A non-electric furnace for high-temperature hydrogen baking of semiconductor wafers to remove native oxides and hydrogen-passivate surface defects before epitaxial growth. It uses forming gas mixtures in a controlled environment.
8417.80.00Rapid Thermal Processing RTP Furnace
A non-electric semiconductor furnace using lamp arrays for ultra-fast wafer heating to 1200°C in seconds for annealing and silicide formation. It is critical for submicron semiconductor device fabrication to prevent dopant redistribution.
8417.80.00Semiconductor Diffusion Furnace
A non-electric industrial furnace for dopant diffusion into semiconductor wafers to create device junctions, using gas phase reactions in horizontal or vertical quartz tubes. It is essential for bipolar and MOS device fabrication.
8417.80.00Silicon Carbide Sublimation Furnace
A non-electric high-temperature furnace using physical vapor transport (PVT) to grow silicon carbide boules for power electronics substrates. It operates above 2000°C in a vacuum with graphite components.
8417.80.00Wafer Annealing Furnace
An industrial non-electric furnace for high-temperature annealing of semiconductor wafers to relieve stresses and activate dopants after ion implantation. It uses rapid thermal processing in controlled atmospheres without electric heating.
8417.80.00Wafer Oxidation Furnace
A non-electric horizontal furnace growing thermal oxide layers on semiconductor wafers via steam or dry oxygen ambient at 900-1200°C. It is fundamental for MOS gate dielectrics and isolation structures.
8417.90.00Crystal Boule Grinder Furnace Heat Shield
A refractory heat shield designed to maintain thermal stability within non-electric industrial furnaces used during crystal boule grinding preparation for semiconductor wafer production. It is a part of the furnace structure, not a standalone machine, and is essential for the furnace's heat containment function.
8417.90.00Crystal Grinder Post-Process Cooling Zone
A controlled cooling section for non-electric industrial furnaces, designed to prevent thermal shock in semiconductor materials after crystal boule grinding. It functions as an integral part of the furnace, regulating post-process cooling to ensure material integrity.
8417.90.00Czochralski Crystal Puller Heating Chamber
A graphite or molybdenum heating chamber used in Czochralski crystal growers for pulling monocrystalline silicon boules in semiconductor manufacturing. This chamber is a critical part of the non-electric furnace, providing the high-temperature environment needed for crystal growth.
8417.90.00Diffusion Furnace Quartz Tube Liner
A high-purity fused quartz liner inserted into diffusion furnace tubes for dopant diffusion into semiconductor wafers during device fabrication. It is a replaceable part of the non-electric furnace, protecting the tube and ensuring uniform heating.
8417.90.00Float Zone Crystal Furnace Crucible Support
A ceramic or quartz support assembly for crucibles in float zone semiconductor crystal growth furnaces, operating non-electrically via RF induction heating. It is a structural part of the furnace, holding the crucible in place during the crystal growth process.
8417.90.00RTP Furnace Lamp Reflector Assembly
A high-reflectivity reflector assembly for directing thermal radiation in Rapid Thermal Processing (RTP) furnaces for semiconductor annealing. It is a part of the non-electric furnace, enhancing heat distribution and efficiency during processing.
8417.90.00Semiconductor Incinerator Combustion Chamber
A stainless steel or ceramic-lined combustion chamber for non-electric incinerators treating semiconductor manufacturing process gases and solvents. It is a key part of the incinerator, containing the combustion process and withstanding high temperatures.
8417.90.00Wafer Annealing Furnace Muffle
A high-temperature resistant muffle (inner chamber) for rapid thermal annealing furnaces used in semiconductor wafer processing to activate dopants and repair crystal damage. It is a part of the non-electric furnace, providing a controlled environment for annealing.
8417.90.00Wafer Lapping Furnace Process Chamber
A thermal process chamber for post-lapping heat treatment furnaces that stabilize semiconductor wafers before polishing. It is an integral part of the non-electric furnace, providing the controlled heating environment needed for wafer stabilization.
8417.90.00Wafer Oxidation Furnace Boat Holder
A precision quartz or silicon carbide holder for wafer boats in thermal oxidation furnaces growing silicon dioxide layers on semiconductor wafers. It is a part of the non-electric furnace, positioning the wafers correctly during the oxidation process.