Rapid Thermal Processing RTP Furnace
A non-electric semiconductor furnace using lamp arrays for ultra-fast wafer heating to 1200°C in seconds for annealing and silicide formation. It is critical for submicron semiconductor device fabrication to prevent dopant redistribution.
Import Duty Rates by Country of Origin
| Origin Country | MFN Tariff | Surtaxes | Total Effective Rate |
|---|---|---|---|
| 🇨🇳China | Free | — | Free |
| 🇲🇽Mexico | Free | — | Free |
| 🇺🇸United States | Free | — | Free |
| 🇩🇪Germany | Free | — | Free |
| 🇯🇵Japan | Free | — | Free |
Alternative Classifications
This product could be classified differently depending on its characteristics or intended use.
If the furnace is used for heat-treatment of ores or metals.
Subheading 8417.10 covers furnaces for roasting, melting or other heat-treatment of ores, which may apply if the RTP process involves metal treatment.
Not sure which classification is right?
The Tariff Assistant works through the GRI rules on your specific product to reach the right tariff item — and can price the duty on it in the same conversation.
Import Tips & Compliance
• Classify as a non-electric industrial furnace under 8417.80.00; provide technical specifications showing the heating method is not electric
• Be ready to explain the RTP process to customs officials
• Verify if the lamp arrays are considered separate parts requiring their own classification
Related Products under Tariff item 8417.80.00
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