Rapid Thermal Processing RTP Furnace from Japan
A non-electric semiconductor furnace using lamp arrays for ultra-fast wafer heating to 1200°C in seconds for annealing and silicide formation. It is critical for submicron semiconductor device fabrication to prevent dopant redistribution.
Duty Rate — Japan → Canada
0%
Import Tips
• Classify as a non-electric industrial furnace under 8417.80.00; provide technical specifications showing the heating method is not electric
• Be ready to explain the RTP process to customs officials
• Verify if the lamp arrays are considered separate parts requiring their own classification