PVD Ion Source Grid Assembly
A multi-aperture grid accelerating ions in ion-assisted PVD deposition sources for enhanced film adhesion. Integral to physical vapor deposition apparatus under subheading 8543.70. Improves coating density in advanced materials processing.
Import Duty Rates by Country of Origin
Alternative Classifications
This product could be classified differently depending on its characteristics or intended use.
If treated as DC motor part
Certain electrical grids might classify under transformers or inductors if misidentified.
If laboratory vacuum parts
Generic lab apparatus parts in Chapter 84 without electrical PVD tie.
If CVD ion beam parts
Different deposition method uses machinery classification.
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Import Tips & Compliance
• Document voltage ratings and aperture geometry; ensure plasma etch resistance certification; pair with end-user letters for apparatus linkage
Related Products under HTS 8543.90.12.00
Titanium Sputtering Target for PVD Systems
A high-purity titanium disc used as the source material in physical vapor deposition (PVD) apparatus for depositing thin titanium films on substrates. It is specifically designed for magnetron sputtering modules within PVD vacuum chambers of subheading 8543.70. Classified under 8543.90.12.00 as a key consumable part essential for the thin-film deposition function of PVD equipment.
Magnetron Sputtering Cathode Assembly
An assembly containing permanent magnets, cooling channels, and mounting fixtures for holding sputtering targets in PVD systems. Essential for generating the plasma discharge in physical vapor deposition apparatus under subheading 8543.70. This part enables uniform thin-film deposition in semiconductor and optics manufacturing.
PVD Vacuum Chamber Baffle
A contoured metal shield installed inside PVD deposition chambers to control plasma distribution and prevent cross-contamination. Made from materials like stainless steel or molybdenum for high-vacuum compatibility in 8543.70 apparatus. Critical for maintaining film uniformity in physical vapor deposition processes.
RF Power Matching Network for PVD
An electronic module that automatically tunes RF power delivery to sputtering sources in PVD systems for optimal plasma ignition. Integral to the electrical control of physical vapor deposition apparatus in subheading 8543.70. Ensures efficient energy transfer in thin-film coating processes.
PVD Substrate Heater Element
A resistively heated platform that maintains substrate temperatures up to 800°C during PVD film deposition. Designed for integration into physical vapor deposition apparatus of subheading 8543.70. Essential for controlling deposition kinetics in microelectronics fabrication.
PVD Quartz Crystal Monitor Sensor
A sensor using quartz crystal microbalance to measure film thickness in real-time during PVD processes. Mounted inside deposition chambers of 8543.70 apparatus for precise process control. Vital for quality assurance in optical and semiconductor coatings.