Of physical vapor deposition apparatus of subheading 8543.70
Electrical machines and apparatus, having individual functions, not specified or included elsewhere in this chapter; parts thereof: > Parts: > Of physical vapor deposition apparatus of subheading 8543.70
Duty Rate (from China)
Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
Except as provided in headings 9903.88.05, 9903.88.06, 9903.88.07, 9903.88.08, 9903.88.10, 9903.88.11, 9903.88.14, 9903.88.19, 9903.88.50, 9903.88.52, 9903.88.58, 9903.88.60, 9903.88.62, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(a) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(b) [to this subchapter]
Products classified under HTS 8543.90.12.00
Titanium Sputtering Target for PVD Systems
A high-purity titanium disc used as the source material in physical vapor deposition (PVD) apparatus for depositing thin titanium films on substrates. It is specifically designed for magnetron sputtering modules within PVD vacuum chambers of subheading 8543.70. Classified under 8543.90.12.00 as a key consumable part essential for the thin-film deposition function of PVD equipment.
Magnetron Sputtering Cathode Assembly
An assembly containing permanent magnets, cooling channels, and mounting fixtures for holding sputtering targets in PVD systems. Essential for generating the plasma discharge in physical vapor deposition apparatus under subheading 8543.70. This part enables uniform thin-film deposition in semiconductor and optics manufacturing.
PVD Vacuum Chamber Baffle
A contoured metal shield installed inside PVD deposition chambers to control plasma distribution and prevent cross-contamination. Made from materials like stainless steel or molybdenum for high-vacuum compatibility in 8543.70 apparatus. Critical for maintaining film uniformity in physical vapor deposition processes.
RF Power Matching Network for PVD
An electronic module that automatically tunes RF power delivery to sputtering sources in PVD systems for optimal plasma ignition. Integral to the electrical control of physical vapor deposition apparatus in subheading 8543.70. Ensures efficient energy transfer in thin-film coating processes.
PVD Substrate Heater Element
A resistively heated platform that maintains substrate temperatures up to 800°C during PVD film deposition. Designed for integration into physical vapor deposition apparatus of subheading 8543.70. Essential for controlling deposition kinetics in microelectronics fabrication.
PVD Quartz Crystal Monitor Sensor
A sensor using quartz crystal microbalance to measure film thickness in real-time during PVD processes. Mounted inside deposition chambers of 8543.70 apparatus for precise process control. Vital for quality assurance in optical and semiconductor coatings.
E-Beam Crucible for PVD Evaporation
A high-temperature ceramic or metal crucible holding evaporant materials in electron beam PVD sources. Designed for use in physical vapor deposition apparatus of subheading 8543.70. Withstands extreme heat for evaporation of metals like gold or aluminum.
PVD Ion Source Grid Assembly
A multi-aperture grid accelerating ions in ion-assisted PVD deposition sources for enhanced film adhesion. Integral to physical vapor deposition apparatus under subheading 8543.70. Improves coating density in advanced materials processing.
PVD Target Shutter Mechanism
A pneumatically or motor-driven shutter blocking the line-of-sight from sputtering target to substrate in PVD systems. Used in multi-layer deposition sequences within 8543.70 apparatus. Prevents unwanted deposition during process initialization.
PVD Plasma Cleaning Head
A RF-powered electrode assembly for pre-deposition substrate cleaning in PVD chambers. Part of physical vapor deposition apparatus in subheading 8543.70, removing contaminants via reactive plasma. Enhances adhesion for high-quality thin films.
PVD Cryogenic Pump Mounting Flange
A precision-machined flange connecting cryogenic pumps to PVD vacuum chambers for ultra-high vacuum maintenance. Specifically for physical vapor deposition apparatus of subheading 8543.70. Ensures contamination-free deposition environments.
PVD Load Lock Door Assembly
A gate valve and viewport assembly for transferring substrates into PVD chambers without breaking vacuum. Designed for physical vapor deposition apparatus in subheading 8543.70. Maintains process integrity in high-throughput production.
PVD Mass Flow Controller Mount
A specialized bracket and feedthrough for mounting gas flow controllers on PVD process manifolds. For apparatus of subheading 8543.70, ensuring precise reactive gas delivery. Critical for controlled atmosphere deposition.
PVD Anode Shield for Arc Suppression
A conductive shield preventing arcing in unbalanced magnetron PVD sources by stabilizing plasma. Part of electrical systems in 8543.70 physical vapor deposition apparatus. Enhances reliability in industrial coating lines.
PVD Planetary Substrate Holder
A rotating fixture holding multiple substrates for uniform coating in large-area PVD systems. Motor-driven for apparatus under subheading 8543.70. Used in solar cell and display manufacturing for even film thickness.