PVD Ion Source Grid Assembly from Japan
A multi-aperture grid accelerating ions in ion-assisted PVD deposition sources for enhanced film adhesion. Integral to physical vapor deposition apparatus under subheading 8543.70. Improves coating density in advanced materials processing.
Duty Rate — Japan → United States
10%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
Import Tips
• Document voltage ratings and aperture geometry; ensure plasma etch resistance certification; pair with end-user letters for apparatus linkage