PVD Ion Source Grid Assembly from Japan
A multi-aperture grid accelerating ions in ion-assisted PVD deposition sources for enhanced film adhesion. Integral to physical vapor deposition apparatus under subheading 8543.70. Improves coating density in advanced materials processing.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Except for products described in headings 9903.05.85–9903.05.92, articles the product of Japan, with an ad valorem (or ad valorem equivalent) rate of duty under column 1 less than 12.5 percent, as provided for in U.S. note 52 to this subchapter
Import Tips
• Document voltage ratings and aperture geometry; ensure plasma etch resistance certification; pair with end-user letters for apparatus linkage