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8543.90.12.00/PVD Ion Source Grid Assembly/Japan

PVD Ion Source Grid Assembly from Japan

A multi-aperture grid accelerating ions in ion-assisted PVD deposition sources for enhanced film adhesion. Integral to physical vapor deposition apparatus under subheading 8543.70. Improves coating density in advanced materials processing.

Duty Rate — Japan → United States

12.5%

Rate breakdown

9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%
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Import Tips

• Document voltage ratings and aperture geometry; ensure plasma etch resistance certification; pair with end-user letters for apparatus linkage

PVD Ion Source Grid Assembly from Japan — Import Duty Rate | HTS 8543.90.12.00