PVD Ion Source Grid Assembly from Germany
A multi-aperture grid accelerating ions in ion-assisted PVD deposition sources for enhanced film adhesion. Integral to physical vapor deposition apparatus under subheading 8543.70. Improves coating density in advanced materials processing.
Duty Rate — Germany → United States
10%
Rate breakdown
9903.05.3910%Section 301 (forced labor) — European Union member state (col1 rate < 10 percent): MFN < 10% → total duty capped at 10%
Import Tips
• Document voltage ratings and aperture geometry; ensure plasma etch resistance certification; pair with end-user letters for apparatus linkage