Semiconductor Wafer Lapping Machine

Double-sided lapping equipment for achieving semiconductor wafer thickness uniformity and surface flatness per statistical note (b)(C). Classified HTS 8465.96.0051 as paring/splitting machine for hard materials in wafer prep. Targets TTV <0.5μm, bow/warp <10μm.

Import Duty Rates by Country of Origin

Origin CountryMFN RateCh.99 SurchargesTotal Effective Rate
🇨🇳China2.4%+17.5%19.9%
🇲🇽Mexico2.4%+10.0%12.4%
🇨🇦Canada2.4%+10.0%12.4%
🇩🇪Germany2.4%+10.0%12.4%
🇯🇵Japan2.4%+10.0%12.4%

Alternative Classifications

This product could be classified differently depending on its characteristics or intended use.

8464.10.01.00Higher: 35% vs 19.9%

If configured for metallographic samples

Lapping machines for lab sample prep classify under grinding/lapping machines.

8486.40.00Higher: 25% vs 19.9%

If post-chemical mechanical polishing lapping

Advanced node wafer processing lappers may fall under semiconductor forming equipment.

Not sure which classification is right?

Our AI classifier can analyze your specific product and recommend the correct HTS code with confidence.

Import Tips & Compliance

Specify lapping plate materials (cast iron/tin) and slurry types proving semiconductor use

Differentiate from metallographic lappers under 9024.80 with wafer cassette documentation

Include throughput specs (50-100 wph) matching fab production rates

Related Products under HTS 8465.96.00.51

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