Silicon Wafer Lapping Plate
Cast iron or ceramic plate used in lapping machines to achieve flatness tolerances on semiconductor wafers post-slicing. Part for 8425 wafer preparation apparatus, in 8431.10.0090. Critical for bringing wafers within nanometer-level planarity before polishing.
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Alternative Classifications
This product could be classified differently depending on its characteristics or intended use.
If for presses used in general surface treatment
Parts for general surface working presses fall under 8435, lacking semiconductor specificity.
If imported as millstones or abrasive wheels
Standalone abrasive grinding wheels without machinery tie go to Chapter 68.
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Import Tips & Compliance
• Document lapping slurry compatibility and flatness specs (<1 micron); avoid general abrasive plate classification
• Use CBP ruling requests for custom plates
Related Products under HTS 8431.10.00.90
Wafer Grinder Air Bearing Pad
Porous carbon pad providing frictionless support for wafer grinding spindles in 8425 equipment. 8431.10.0090 classification maintains <0.5 micron flatness. Critical for vibration-free surface preparation.
Diamond Wafer Slicing Saw Arbor
Precision shaft holding diamond blade in wafer slicing saws of heading 8425. 8431.10.0090 part ensures spindle runout <1 micron. Hardened steel with coolant channels for continuous operation.
CMP Polisher Platen Assembly
Rotating platen holding polishing pad in chemical mechanical planarization tools for wafers. Integral part of 8425 polishers under 8431.10.0090. Composite construction for uniform pressure distribution.
Semiconductor Wafer Lapper Conditioning Ring
Diamond pellet ring for dressing lapping plates in wafer prep equipment of 8425. 8431.10.0090 part maintains plate flatness during production. Prevents glazing for consistent removal rates.
Czochralski Crystal Puller Furnace
A high-temperature furnace used in the Czochralski method to grow monocrystalline silicon boules for semiconductor wafer production. It is a part of crystal grower and puller machinery classified under HTS 8425 as semiconductor manufacturing equipment. The 'Other' subheading 8431.10.0090 applies to specialized parts not elsewhere specified for heading 8425 machinery.
Float Zone Crystal Growth Chamber
A vacuum chamber component for float zone method crystal growers, producing high-purity silicon ingots for wafers. Classed as a part for 8425 semiconductor machinery under 8431.10.0090. Ensures precise control of zone melting process in semiconductor material growth.