Wafer Edge Profiling Machine

Equipment for profiling wafer edges to remove micro-cracks and control edge geometry, using grinding with temperature-controlled coolant. Prevents chipping during handling. Under 8419.90.50.80 for wafer preparation parts.

Import Duty Rates by Country of Origin

Origin CountryMFN RateCh.99 SurchargesTotal Effective Rate
🇨🇳ChinaFree+35.0%35%
🇲🇽MexicoFree+10.0%10%
🇨🇦CanadaFree+10.0%10%
🇩🇪GermanyFree+10.0%10%
🇯🇵JapanFree+10.0%10%

Alternative Classifications

This product could be classified differently depending on its characteristics or intended use.

8460.39.00Higher: 39.4% vs 35%

If sharpening/grinding machines

General edge grinding shifts to heading 8460 if not semiconductor-specific.

Not sure which classification is right?

Our AI classifier can analyze your specific product and recommend the correct HTS code with confidence.

Import Tips & Compliance

Specify edge profiles (e.g

shark-fin vs. butt); declare chip-out specs; comply with SEMI standards

Related Products under HTS 8419.90.50.80

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A Czochralski method crystal puller used to grow monocrystalline silicon boules from molten silicon for semiconductor wafer production. It controls temperature precisely to pull high-purity crystals, involving heating and controlled cooling processes. Classified under 8419.90.50.80 as a part for semiconductor manufacturing equipment involving temperature change for material treatment.

Float Zone Silicon Crystal Grower

Float zone furnace apparatus for producing ultra-pure silicon crystals by zone melting, heating a narrow zone of polycrystalline silicon rod to melt and recrystallize. Used in semiconductor industry for high-resistivity wafers. Falls under 8419.90.50.80 for parts of temperature-treatment equipment in semiconductor processing.

Crystal Boule Grinder

Precision grinder for shaping semiconductor crystal boules to exact diameter and flats indicating conductivity type. Generates controlled heat during grinding for material treatment. Part of wafer prep equipment under 8419.90.50.80 for temperature-involved semiconductor processing.

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High-precision inner-diameter saw with diamond blade for slicing monocrystalline boules into thin semiconductor wafers. Coolant systems manage heat from cutting process. Classified in 8419.90.50.80 as part for wafer manufacturing temperature treatment.

Semiconductor Wafer Lapper

Lapping machine that uses abrasive slurries to flatten semiconductor wafers to optical tolerances, controlling slurry temperature for uniform material removal. Critical for wafer flatness before polishing. Under 8419.90.50.80 for semiconductor wafer prep equipment.

Double-Sided Wafer Polisher

Chemical-mechanical planarization (CMP) polisher for simultaneous double-sided polishing of silicon wafers, maintaining precise temperature control of polishing pads and slurries. Prepares wafer surface for device fabrication. Fits 8419.90.50.80 as semiconductor processing part.