Epitaxial Reactor Cold Wall System

Cold wall cooling assembly for MOCVD epitaxial reactors, maintaining chamber walls at stable low temperatures during high-heat thin film deposition on wafers. Falls under 8419.89.9540 as cooling equipment for semiconductor processing temperature management. Critical for layer uniformity.

Import Duty Rates by Country of Origin

Origin CountryMFN RateCh.99 SurchargesTotal Effective Rate
🇨🇳China4.2%+35.0%39.2%
🇲🇽Mexico4.2%+10.0%14.2%
🇨🇦Canada4.2%+10.0%14.2%
🇩🇪Germany4.2%+10.0%14.2%
🇯🇵Japan4.2%+10.0%14.2%

Alternative Classifications

This product could be classified differently depending on its characteristics or intended use.

8479.89Lower: 12.5% vs 39.2%

If imported as complete epitaxial deposition machinery

Full semiconductor processing machines including cooling classify in 8479

8419.89.95Same rate: 39.2%

If for laboratory-scale epitaxial cooling rather than production

Lab equipment statistical suffix differs from industrial production cooling

Not sure which classification is right?

Our AI classifier can analyze your specific product and recommend the correct HTS code with confidence.

Import Tips & Compliance

Submit reactor chamber thermal profile data proving cold wall cooling necessity

Classify as complete cooling system, not reactor part, to avoid 8479

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