Vanadium-Nickel Sputtering Target
A fabricated vanadium-nickel alloy disk used as a sputtering target for thin-film deposition in semiconductor and electronics manufacturing. HTS 8112.99.2000 covers such 'articles' of vanadium alloys where vanadium content is under 99% but dominant. Excludes pure metal targets.
Import Duty Rates by Country of Origin
Alternative Classifications
This product could be classified differently depending on its characteristics or intended use.
If manufacturing scrap or trimmings
Target offcuts or rejects qualify as waste/scrap under subheading.
If assembled into semiconductor wafer processing equipment
Integrated into machinery parts shifts to Chapter 84/85 for electrical apparatus.
If remelted into powder metallurgy forms
Certain granular alloys for powder met may go to Chapter 72 ferrosilicon-vanadium.
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Import Tips & Compliance
• Submit CAD drawings or specs confirming fabricated article status vs raw alloy
• Ensure REACH/SVHC declarations if destined for EU; TSCA for US
Related Products under HTS 8112.99.20.00
Vanadium-Titanium Alloy Wire
Drawn wire of vanadium-titanium alloy for welding electrodes and additive manufacturing. HTS 8112.99.2000 as other articles where vanadium predominates per alloy note. Wire form elevates from unwrought.
Vanadium Powder Blend Alloy
Blended vanadium alloy powder (not pure powder) for metal injection molding, 60% V balance. Borderline but 'article' under 8112.99.2000 if processed.
Vanadium Alloy Foil
Thin foil of vanadium alloy for battery current collectors. HTS 8112.99.2000.
Vanadium Rod Segments
Cut rod segments of alloy for lab use. 8112.99.2000.
Nitrogen-Binding Vanadium Alloy
Specialty alloy for steel degassing. 8112.99.2000.
Vanadium Alloy Anode
Electroplating anode article. 8112.99.2000.