Vanadium-Nickel Sputtering Target

A fabricated vanadium-nickel alloy disk used as a sputtering target for thin-film deposition in semiconductor and electronics manufacturing. HTS 8112.99.2000 covers such 'articles' of vanadium alloys where vanadium content is under 99% but dominant. Excludes pure metal targets.

Import Duty Rates by Country of Origin

Origin CountryMFN RateCh.99 SurchargesTotal Effective Rate
🇨🇳China2%+35.0%37%
🇲🇽Mexico2%+10.0%12%
🇨🇦Canada2%+10.0%12%
🇩🇪Germany2%+10.0%12%
🇯🇵Japan2%+10.0%12%

Alternative Classifications

This product could be classified differently depending on its characteristics or intended use.

8112.99Same rate: 37%

If manufacturing scrap or trimmings

Target offcuts or rejects qualify as waste/scrap under subheading.

8543.70Lower: 12.6% vs 37%

If assembled into semiconductor wafer processing equipment

Integrated into machinery parts shifts to Chapter 84/85 for electrical apparatus.

7205.21.00.00Lower: 35% vs 37%

If remelted into powder metallurgy forms

Certain granular alloys for powder met may go to Chapter 72 ferrosilicon-vanadium.

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Import Tips & Compliance

Submit CAD drawings or specs confirming fabricated article status vs raw alloy

Ensure REACH/SVHC declarations if destined for EU; TSCA for US